Clean Room Facility

Class ISO 7 Clean Room Facility equipped with:

N. 2 UV optical lithography mask aligners: MJb3 and MJB4 by SUSS;
N. 2 e-beam pattern generators (EBL) at 30 keV: NPGS v. 9.0 from Nabity Systems; Elphy PLUS with NanoPECS from Raith GmbH;
FEG-SEM, Ultra Plus from ZEISS, 30 kV 1.2 nm resolution, N2 gas injector system for imaging on insulators;
FEG-SEM, Merlin from ZEISS, 30 kV 0.8 nm resolution, N2 gas injector system for imaging on insulators and O2 gas injector for ozone cleaning;
Nanoimprint lithographic system (2.5” wafer) from Obducat;
N. 2 Scanning Probe Microscopes (AFM, EFM, liquid cell, lithography): Caliber SPM from BRUKER;
Rapid Thermal Annealer (RTA);
Oxygen Plasma Cleaner;
N.2 Spin Coaters;
Contact Angle Measuring system;
Hot plates and oven for thermal resist treatment;
Nomarsky Optical Microscope;
N.3 high-vacuum Thermal Evaporators;
N. 1 UHV e-beam Evaporator;
Stylus Profilometer;
Wet bench station;