Facilities:
sei in: Map » First Floor » Clean Room Facility
SPM phone: 9129
EBL phone: 9479
Open space phone: 9487
EBL phone: 9479
Open space phone: 9487
Clean Room Facility
Cleanroom Guidelines
Class ISO 7 Clean Room Facility equipped with:
- N. 2 UV optical lithography mask aligners: MJb3 and MJB4 by SUSS;
- N. 3 e-beam pattern generators (EBL) at 30 keV: NPGS v. 9.0 from Nabity Systems and Elphy PLUS with NanoPECS from Raith GmbH on Merlin FEG-SEM; Multibeam from Raith GmbH on UltraPlus FEG-SEM;
- FEG-SEM, Ultra Plus from ZEISS, 30 kV 1.2 nm resolution, N2 gas injector system for imaging on insulators, interferometric stage (2" from Raith GmbH), EDS (Bruker Quantax) and STEM (ZEISS) detectors;
- FEG-SEM, Merlin from ZEISS, 30 kV 0.8 nm resolution, N2 gas injector system for imaging on insulators and O2 gas injector for ozone cleaning;
- Nanoimprint lithographic system (2.5” wafer) from Obducat;
- Scanning Probe Microscope (AFM, LFM, KPFM, CFM, Scan-Asyst, Peak Force Tapping): Dimension ICON-PT from Bruker;
- Rapid Thermal Annealer (RTA);
- Oxygen Plasma Cleaner;
- N.2 Spin Coaters;
- Contact Angle Measuring system;
- Hot plates and oven for thermal resist treatment;
- Nomarsky Optical Microscope;
- N.3 high-vacuum Thermal Evaporators;
- N. 1 UHV e-beam Evaporator;
- 3D Stylus Profilometer DEKTAK XT from Bruker;
- Wet bench station;
- Wafer Bonding system from SUSS Microtech GmBH;
- 4 minirobots "Imina Technology" for SEM and Optical microscopy nanomanipulation;
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