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CBE, Plasma Etching and Deposition

Map: Lab 0.5 Webcam RIE Webcam CBE
  • Chemical Beam Epitaxy for semiconductor nanowire growth;
  • Reactive Ion Etching (RIE) system based on CH4/H2 chemistry;
  • PECVD system for SiO2 growth;
  • RIE-ICP system based on Cl, BCl3 chemistry;
  • DC - Sputtering system for Nb and NbN film deposition, Ar sputtering, Sm desorption;
  • Atomic Layer Deposition (ALD): "Opal", thermal and plasma system by Oxford Instruments;

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